Company Filing History:
Years Active: 1994-2008
Title: The Innovative Contributions of Pamela E. Jones
Introduction
Pamela E. Jones is a distinguished inventor based in the Bronx, NY. She has made significant contributions to the field of precision surface cleaning, particularly in the semiconductor industry. With a total of 5 patents to her name, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Among her latest patents is a groundbreaking process for removing residue from precision surfaces using a liquid or supercritical carbon dioxide composition. This composition includes liquid or supercritical carbon dioxide and an acid with a pKa of less than about 4. The process is designed to effectively clean semiconductor samples by ensuring that the precision surface is contacted with the composition under thermodynamic conditions that maintain the liquid or supercritical state of the carbon dioxide.
Career Highlights
Pamela is currently employed at International Business Machines Corporation, commonly known as IBM. Her role at IBM has allowed her to further develop her innovative ideas and contribute to advancements in technology. Her expertise in precision cleaning processes has positioned her as a valuable asset within the company.
Collaborations
Throughout her career, Pamela has collaborated with notable colleagues, including Wayne Martin Moreau and Kevin Michael Welsh. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.
Conclusion
Pamela E. Jones exemplifies the spirit of innovation in the field of precision surface cleaning. Her contributions, particularly in the semiconductor industry, highlight the importance of her work and its impact on technology.