The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 1995

Filed:

Feb. 16, 1993
Applicant:
Inventors:

Robert R Dichiara, Middletown, NY (US);

James T Fahey, Poughkeepsie, NY (US);

Pamela E Jones, Bronx, NY (US);

Christopher F Lyons, LaGrangeville, NY (US);

Wayne M Moreau, Wappingers Falls, NY (US);

Ratnam Sooriyakumaran, Fishkill, NY (US);

Gary T Spinillo, Wappingers Falls, NY (US);

Kevin M Welsh, Fishkill, NY (US);

Robert L Wood, Poughkeepsie, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430323 ; 430270 ; 430272 ; 522904 ;
Abstract

An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.


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