Hennepin County, MN, United States of America

Kevin Michael Welsh


Average Co-Inventor Count = 6.0

ph-index = 8

Forward Citations = 283(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (1992)
  • Fishkill, NY (US) (1994 - 1996)
  • Plymouth, MN (US) (1997 - 1998)
  • Hennepin County, MN (US) (1997 - 2001)

Company Filing History:


Years Active: 1992-2001

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Kevin Michael Welsh: Innovator in Microlithography Technologies

Introduction

Kevin Michael Welsh is a prominent inventor based in Hennepin County, Minnesota, known for his significant contributions to the field of microlithography. With a remarkable portfolio comprising 12 patents, Kevin has exhibited a strong dedication to advancing technologies in this specialized industry.

Latest Patents

Among Kevin's most notable inventions is an antireflective coating for microlithography. The co-polymer of benzophenone and bisphenol A has demonstrated excellent DUV absorption properties, making it particularly useful as an antireflective coating in microlithography applications. Notably, the incorporation of anthracene into the co-polymer backbone enhances its absorption at 248 nm, offering flexibility in selecting an endcapper that promotes adhesion, stability, and absorption of various wavelengths.

Another recent patent involves the making of microlithographic structures with an improved underlayer film. This invention outlines microlithographic methods utilizing enhanced underlayers for chemically amplified deep UV photoresist compositions, allowing for the creation of optimal structures. The compositions consist of a polymeric binder in admixture with an azide that is thermolyzed during processing to form an amine. When applied directly beneath chemically amplified photoresist films, these underlayer compositions effectively reduce resist structure sidewall foot or undercut issues caused by adverse contact reactions.

Career Highlights

Kevin Michael Welsh is currently affiliated with the International Business Machines Corporation (IBM), where he contributes his extensive expertise in microlithography. His work focuses on developing innovative technologies that enhance the capabilities and performance of microlithographic processes.

Collaborations

Throughout his career, Kevin has collaborated with esteemed colleagues Wayne Martin Moreau and James Thomas Fahey. Together, they have shared insights and knowledge, fostering an environment of innovation and creativity in their projects.

Conclusion

Kevin Michael Welsh's inventive spirit and dedication to advancing microlithography have resulted in significant technological advancements. With 12 patents to his name, his contributions continue to influence the industry and inspire future inventors in the field.

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