Location History:
- Lagrangeville, NY (US) (1984 - 1999)
- Freemont, CA (US) (1998 - 2000)
Company Filing History:
11 out of 164,108 
1 out of 507 
Years Active: 1984-2000
Title: **Innovations by Christopher F. Lyons: A Pioneer in Photolithography Technology**
Introduction
Christopher F. Lyons, based in LaGrangeville, NY, is a significant figure in the field of photolithography and materials science, holding an impressive total of 12 patents. His contributions to the development of advanced photoresist technologies have greatly influenced industries reliant on precision patterning.
Latest Patents
Among Lyons' latest patents is a groundbreaking technology for a top antireflective coating film. This innovation enhances the fidelity of pattern transfer in aqueous developable photoresist compositions. The fluorine-containing top antireflective coatings have a refractive index that approximates the square root of the underlying photoresist, allowing them to be easily removed in the developer for photoresist applications.
Another notable patent is the phase-averaging resist coating for reflectivity control. This method addresses linewidth variations in the patterning of photoresists with non-uniform film thickness. By overcoating the photoresist with a nonreactive coating composition that maintains a refractive index within ±15 percent of that of the photoresist, it enables precise control of light reflection. This advancement is crucial for achieving higher resolution in photolithographic processes.
Career Highlights
Christopher F. Lyons has garnered substantial experience through his work with prominent companies, including IBM and Clariant Finance (BVI) Limited. His tenure at these organizations has allowed him to collaborate on cutting-edge research and development, pushing the boundaries of existing technologies in his field.
Collaborations
Throughout his career, Lyons has collaborated with esteemed colleagues, including Robert Lavin Wood and Wayne Martin Moreau. These partnerships have enriched his research, fostering an environment of innovation and shared knowledge that has contributed to his numerous patents and technological advancements.
Conclusion
Christopher F. Lyons stands out as a visionary inventor whose patents are paving the way for advancements in the photolithography industry. His dedication to refining photoresist technologies and improving pattern transfer fidelity highlights the importance of continuous innovation. As his research progresses, it is certain that his contributions will have a lasting impact on various high-tech applications.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.