The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1998
Filed:
May. 27, 1997
Applicant:
Inventors:
William R Brunsvold, Poughkeepsie, NY (US);
George J Hefferon, Fishkill, NY (US);
Christopher F Lyons, LaGrangeville, NY (US);
Wayne M Moreau, Wappingers Falls, NY (US);
Robert L Wood, Poughkeepsie, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
524520 ; 524164 ; 524165 ; 524319 ; 524462 ; 524463 ; 524503 ; 524545 ; 524546 ; 430273 ;
Abstract
Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.