Location History:
- Dutches County, NY (US) (1997)
- Wappingers Falls, NY (US) (1993 - 1999)
- Dutchess County, NY (US) (1996 - 2001)
Company Filing History:
Years Active: 1993-2001
Title: The Innovative Mind of Gary T. Spinillo
Introduction
Gary T. Spinillo, an accomplished inventor based in Wappingers Falls, NY, has made significant contributions to the field of microlithography through his innovative inventions. With a remarkable portfolio of 11 patents to his name, Spinillo's work is noteworthy for its technical depth and application in industrial settings.
Latest Patents
Spinillo's latest patents showcase his expertise in developing advanced materials and methods for microlithography. One of his key inventions is an antireflective coating for microlithography, which utilizes a co-polymer of benzophenone and bisphenol A that exhibits deep ultraviolet (DUV) absorption properties. This co-polymer proves particularly useful as an antireflective coating in microlithography applications. The incorporation of anthracene into the co-polymer backbone further enhances its absorption capabilities at 248 nm, making it a versatile option for various microlithography needs.
Another significant patent developed by Spinillo focuses on a phase-averaging resist coating for reflectivity control. This method effectively reduces linewidth variations in the patterning of photoresists with non-uniform film thickness. By overcoating the photoresist with a nonreactive composition that has a refractive index closely matching that of the photoresist, it creates a one wavelength phase lag between oblique and normal incident rays reflecting back from the substrate. Such innovations not only enhance accuracy in microlithography but also improve the overall performance of photolithographic processes.
Career Highlights
Gary T. Spinillo has built a distinguished career at the International Business Machines Corporation (IBM), where he has contributed to numerous advancements in technology. His focus on microlithography positions him as a key player in developing techniques critical for the manufacturing of electronic components.
Collaborations
Throughout his career, Spinillo has worked alongside talented colleagues, including Robert Lavin Wood and Kevin Michael Welsh. These collaborations have facilitated the exchange of ideas and further enhanced the quality and impact of their work in the field of microlithography.
Conclusion
Gary T. Spinillo's innovative contributions to microlithography and his impressive portfolio of patents reflect his dedication to advancing technology. As he continues to work at IBM, his ongoing research and development promise to drive further innovations that could reshape the landscape of the industry. His work not only exemplifies individual brilliance but also highlights the importance of collaboration in the pursuit of technological advancement.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.