The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 1996
Filed:
Mar. 29, 1995
Applicant:
Inventors:
Kathleen M Cornett, Dutchess County, NY (US);
Judy B Dorn, Dutchess County, NY (US);
Margaret C Lawson, Dutchess County, NY (US);
Leo L Linehan, Orange County, NY (US);
Wayne M Moreau, Dutchess County, NY (US);
Randolph J Smith, Orange County, NY (US);
Gary T Spinillo, Dutchess County, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08L / ; C08L / ;
U.S. Cl.
CPC ...
525143 ; 525148 ; 525227 ; 525241 ; 525502 ; 525508 ;
Abstract
A polyalkylmethacrylate co-polymer of polyhydroxystyrene has been found to be an ideal blending partner in a novolak photoresist composition. The preferred co-polymer is poly(p-hydroxystyrene)-co-(methyl methacrylate). The co-polymer is fully miscible with novolaks and has a high thermal stability (>150.degree. C.).