Company Filing History:
Years Active: 1996
Title: Judy B Dorn: Innovator in Photoresist Technology
Introduction
Judy B Dorn is a prominent inventor known for her contributions to the field of photoresist technology. Based in Dutchess County, NY, she has been instrumental in developing innovative solutions that enhance the performance of photoresist compositions. With a total of two patents to her name, her work has significantly impacted the semiconductor industry.
Latest Patents
Judy B Dorn's latest patents include a photoresist composition that features a polyalkylmethacrylate co-polymer. This co-polymer, specifically poly(p-hydroxystyrene)-co-(methyl methacrylate), has been identified as an ideal blending partner in novolak photoresist compositions. The co-polymer demonstrates full miscibility with novolaks and exhibits high thermal stability, exceeding 150 degrees Celsius. Another notable patent addresses the elimination of microbridging in chemically amplified negative tone photoresists. By blending poly(hydroxystyrene) with a co-polymer of PHS and an acrylic polymer like poly(methyl methacrylate), microbridge formation is effectively avoided. This innovative blend reduces crosslinking sites, making the photoresist less susceptible to microbridge formation.
Career Highlights
Judy B Dorn has made significant strides in her career, particularly through her work at International Business Machines Corporation (IBM). Her expertise in photoresist technology has positioned her as a key player in the development of advanced materials for the semiconductor industry. Her contributions have not only advanced the field but have also paved the way for future innovations.
Collaborations
Throughout her career, Judy has collaborated with notable colleagues, including Leo L Linehan and Wayne Martin Moreau. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Judy B Dorn's work in photoresist technology exemplifies the impact of innovative thinking in the semiconductor industry. Her patents reflect a commitment to advancing materials that enhance performance and reliability. Through her career at IBM and collaborations with esteemed colleagues, she continues to contribute to the evolution of technology.