Company Filing History:

12 out of 164,108

International Business Machines Corporation

patents

1 out of 5,966

Shin-etsu Chemical Co., Ltd.

where one patent can have more than one assignee

Years Active: 1996-2017

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13 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9551696 - Cleanability assessment of sublimate from lithography materials (2017-01-24),

2. 8759220 - Patterning process (2014-06-24),

3. 8304178 - Top antireflective coating composition containing hydrophobic and acidic groups (2012-11-06),

4. 8202678 - Wet developable bottom antireflective coating composition and method for use thereof (2012-06-19),

5. 7709187 - High resolution imaging process using an in-situ image modifying layer (2010-05-04),

6. 7700262 - Top coat material and use thereof in lithography processes (2010-04-20),

7. 7608390 - Top antireflective coating composition containing hydrophobic and acidic groups (2009-10-27),

8. 7563563 - Wet developable bottom antireflective coating composition and method for use thereof (2009-07-21),

9. 7335456 - Top coat material and use thereof in lithography processes (2008-02-26),

10. 6927015 - Underlayer compositions for multilayer lithographic processes (2005-08-09),

11. 6818381 - Underlayer compositions for multilayer lithographic processes (2004-11-16),

12. 6534239 - Resist compositions with polymers having pendant groups containing plural acid labile moieties (2003-03-18),

13. 5561194 - Photoresist composition including polyalkylmethacrylate co-polymer of (1996-10-01),

Title: Innovations by Margaret C Lawson: A Leader in Lithography Patents

Introduction: Margaret C Lawson is an accomplished inventor based in Lagrangeville, NY, with a remarkable portfolio of 13 patents. Her work primarily focuses on advancements in lithography materials and processes, contributing significantly to the field of material science and semiconductor manufacturing.

Latest Patents: Lawson’s recent patents showcase her innovative approach to cleanability and patterning processes. One of her notable inventions is the "Cleanability assessment of sublimate from lithography materials," which involves a method for testing the cleanability of polymerized sublimate outgassed during thermal heating. This patent describes a method including placing a wafer on a hotplate inside a chamber and determining the effectiveness of organic solvents in cleaning the polymerized sublimate.

Another significant patent is her "Patterning process," which emphasizes a detailed approach to forming a titanium-containing resist underlayer and subsequently patterning that onto an organic underlayer film using photoresist techniques. This innovative patterning process allows for the removal of a resist underlayer with milder conditions, preventing damage to the processed body.

Career Highlights: Margaret's career features influential positions at leading companies such as IBM and Shin-Etsu Chemical Co., Ltd. Her tenure at these prominent organizations enabled her to refine her skills and contribute to vital innovations in lithography and material processing.

Collaborations: Throughout her career, Lawson has collaborated with notable professionals in her field, including Pushkara Rao Varanasi and Mahmoud M Khojasteh. These collaborations have further enriched her work and contributed to the advancements she has achieved in the realm of patentable technologies.

Conclusion: Margaret C Lawson emerges as a pivotal figure in the world of innovations related to lithography materials. With her 13 patents underpinning her expertise, her contributions not only advance the scientific community but also set new benchmarks in the industry. Her work serves as an inspiration for future inventors and innovators in the field.

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