The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Oct. 23, 2006
Kaushal Patel, Wappingers Falls, NY (US);
Wu-song Huang, Poughkeepsie, NY (US);
Margaret C. Lawson, LaGrangeville, NY (US);
Jaione Tirapu Azpiroz, Poughkeepsie, NY (US);
Kaushal Patel, Wappingers Falls, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Margaret C. Lawson, LaGrangeville, NY (US);
Jaione Tirapu Azpiroz, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming a patterned material layer on a substrate. A photoresist layer is formed on the substrate followed by an image modifying material formed on the photoresist. The image modifying material is patterned to form an image modifying pattern. The image modifying pattern and underlying photoresist are then exposed to suitable radiation. The image modifying pattern modifies the image intensity within the photoresist layer beneath the image modifying pattern. The resulting pattern is then transferred into the substrate.