The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Jun. 04, 2009
Kuang-jung J. Chen, Poughkeepsie, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Ranee Wai-ling Kwong, Wappingers Falls, NY (US);
Margaret C. Lawson, Lagrangeville, NY (US);
Wenjie LI, Poughkeepsie, NY (US);
Kaushal S. Patel, Wappingers Falls, NY (US);
Pushkara R. Varanasi, Poughkeepsie, NY (US);
Kuang-Jung J. Chen, Poughkeepsie, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Ranee Wai-Ling Kwong, Wappingers Falls, NY (US);
Margaret C. Lawson, Lagrangeville, NY (US);
Wenjie Li, Poughkeepsie, NY (US);
Kaushal S. Patel, Wappingers Falls, NY (US);
Pushkara R. Varanasi, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.