Company Filing History:

11 out of 164,108

International Business Machines Corporation

Years Active: 2003-2016

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9235119 - Exposure photolithography methods (2016-01-12),

2. 8846296 - Photoresist compositions (2014-09-30),

3. 8835307 - Method and structure for reworking antireflective coating over semiconductor substrate (2014-09-16),

4. 8568960 - Multiple exposure photolithography methods (2013-10-29),

5. 8288271 - Method for reworking antireflective coating over semiconductor substrate (2012-10-16),

6. 8236476 - Multiple exposure photolithography methods and photoresist compositions (2012-08-07),

7. 8202678 - Wet developable bottom antireflective coating composition and method for use thereof (2012-06-19),

8. 8053172 - Photoresists and methods for optical proximity correction (2011-11-08),

9. 8021828 - Photoresist compositions and methods related to near field masks (2011-09-20),

10. 7563563 - Wet developable bottom antireflective coating composition and method for use thereof (2009-07-21),

11. 7168224 - Method of making a packaged radiation sensitive resist film-coated workpiece (2007-01-30),

12. 6543617 - Packaged radiation sensitive coated workpiece process for making and method of storing same (2003-04-08),

Title: Ranee Wai-Ling Kwong: Innovator in Photolithography

Introduction

Ranee Wai-Ling Kwong is a prominent inventor based in Wappingers Falls, NY (US). She has made significant contributions to the field of photolithography, holding a total of 12 patents. Her innovative work has advanced the technology used in semiconductor manufacturing and other applications.

Latest Patents

Ranee's latest patents include methods for exposure photolithography. One method involves forming a film of photoresist composition on a substrate and exposing specific regions of the film to radiation through masks with distinct image patterns. The photoresist composition she developed includes a polymer with acid labile groups and a photosensitive acid generator that produces varying amounts of acid based on radiation exposure. Additionally, her patents cover photoresist compositions that utilize a photosensitive base generator, which also responds to radiation in a controlled manner.

Career Highlights

Throughout her career, Ranee has worked with notable companies such as IBM and Globalfoundries Inc. Her experience in these leading organizations has allowed her to refine her expertise in photolithography and contribute to groundbreaking advancements in the field.

Collaborations

Ranee has collaborated with esteemed colleagues, including Pushkara Rao Varanasi and Wu-Song S Huang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Ranee Wai-Ling Kwong's contributions to photolithography exemplify her dedication to innovation and excellence in her field. Her patents and collaborations continue to influence the industry and inspire future advancements.

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1 patent (EPO):

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