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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8835307 B1

PDFFull Text
Expired
Date of Patent:
Sep. 16, 2014

Filed:

May. 10, 2012

Method and structure for reworking antireflective coating over semiconductor substrate

Applicants:

Hakeem Akinmade-yusuff, Hopewell Junction, NY (US);

John A. Fitzsimmons, Hopewell Junction, NY (US);

Ranee Wai-ling Kwong, Hopewell Junction, NY (US);

Inventors:

Hakeem Akinmade-Yusuff, Hopewell Junction, NY (US);

John A. Fitzsimmons, Hopewell Junction, NY (US);

Ranee Wai-Ling Kwong, Hopewell Junction, NY (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorney:

Yuanmin Cai

Primary Examiner:

Laura Menz

Assistant Examiner:

Maliheh Malek

Int. Cl.
CPC ...
H01L 33/44 (2010.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01); G03F 7/42 (2006.01); G03F 7/09 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31138 (2013.01); H01L 21/31144 (2013.01); H01L 21/0276 (2013.01); G03F 7/422 (2013.01); G03F 7/091 (2013.01);
Abstract

A method and a structure for reworking an antireflective coating (ARC) layer over a semiconductor substrate. The method includes providing a substrate having a material layer, forming a planarization layer on the material layer, forming an organic solvent soluble layer on the planarization layer, forming an ARC layer on the organic solvent soluble layer, forming a pattern in the ARC layer, and removing the organic solvent soluble layer and the ARC layer with an organic solvent while leaving the planarization layer unremoved. The structure includes a substrate having a material layer, a planarization layer on the material layer, an organic solvent soluble layer on the planarization layer, and an ARC layer on the organic solvent soluble layer.

Find Patent Forward Citations

Akinmade-Yusuff, Hakeem. (2014). Method and structure for reworking antireflective coating over semiconductor substrate (U.S. Patent No. 8835307). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8835307

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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