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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Kuang-Jung Chen

This inventor holds 44 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Photolithography Techniques. Top assignees: International Business Machines Corporation, Globalfoundries Inc., Jsr Corporation. Active years: 2000-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuang-Jung Chen. Retrieved from https://idiyas.com/inventor/kuang-jung-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 44 

% Patents Active = 38.6

 

Average Co-Inventor Count = 4.4

ph-index = 9

Forward Citations = 425(Granted Patents)


Location History:

  • Poughkeepsie, NY (US) (2000 - 2016)
  • Hopewell Junction, NY (US) (2012 - 2016)

Company Filing History:

goldMedal40 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal3 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal1 out of 1,078 
 
Jsr Corporation
 patents
4. 1 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2000-2016

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Areas of Expertise:
Photolithography
Photoresist Compositions
Semiconductor Structures
Multiple Exposure
Pattern Formation
Developable Coatings
Critical Dimension
Chemical Treatment
Etch Resistance
Nano-Patterning
Hybrid Resists
Irradiation Sensitivity
44 patents (USPTO):Explore Patents
1. 9449822 - Method of forming semiconductor structures with contact holes (2016-09-20),
2. 9316916 - Method to mitigate resist pattern critical dimension variation in a double-exposure process (2016-04-19),
3. 9235119 - Exposure photolithography methods (2016-01-12),
4. 9093387 - Metallic mask patterning process for minimizing collateral etch of an underlayer (2015-07-28),
5. 9040225 - Developable bottom antireflective coating composition and pattern forming method using thereof (2015-05-26),
6. 8999624 - Developable bottom antireflective coating composition and pattern forming method using thereof (2015-04-07),
7. 8986918 - Hybrid photoresist composition and pattern forming method using thereof (2015-03-24),
8. 8932796 - Hybrid photoresist composition and pattern forming method using thereof (2015-01-13),
9. 8871596 - Method of multiple patterning to form semiconductor devices (2014-10-28),
10. 8846296 - Photoresist compositions (2014-09-30),
11. 8846295 - Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof (2014-09-30),
12. 8802347 - Silicon containing coating compositions and methods of use (2014-08-12),
13. 8715907 - Developable bottom antireflective coating compositions for negative resists (2014-05-06),
14. 8609327 - Forming sub-lithographic patterns using double exposure (2013-12-17),
15. 8568960 - Multiple exposure photolithography methods (2013-10-29),

Title: Innovations and Contributions of Kuang-Jung Chen

Introduction

Kuang-Jung Chen is an esteemed inventor based in Poughkeepsie, NY, with an impressive portfolio of 44 patents. His work primarily focuses on advancements in semiconductor technology, showcasing his significant contributions to the field of electronics.

Latest Patents

Among Kuang-Jung Chen's latest patents are groundbreaking methods that enhance the efficiency of semiconductor manufacturing processes. One notable patent is a "Method of forming semiconductor structures with contact holes." This innovation details a process that includes forming shapes on a substrate, applying a layer of copolymer, and transferring a pattern of contact holes to create a semiconductor structure. Notably, it describes forming shapes in the form of rings, where cylindrical blocks are strategically placed both inside and outside these rings.

Another critical patent is titled "Method to mitigate resist pattern critical dimension variation in a double-exposure process." This patent outlines a method to control critical dimension variation during the double-exposure photoresist process by developing patterns that enhance the overall accuracy and functionality of semiconductor devices.

Career Highlights

Throughout his career, Kuang-Jung Chen has worked with leading companies in the semiconductor industry, including IBM and Globalfoundries Inc. His role at these prestigious organizations has allowed him to play a critical part in the advancement of semiconductor fabrication techniques.

Collaborations

Kuang-Jung Chen has collaborated with notable professionals in his field, including Wu-Song S. Huang and Pushkara Rao Varanasi. These collaborations highlight the importance of teamwork and shared expertise in driving technological innovation.

Conclusion

In conclusion, Kuang-Jung Chen's contributions to the semiconductor industry have been instrumental in shaping modern electronics. His innovative patents and collaborative spirit underscore the ongoing importance of research and development in fostering technological advancements. With a robust portfolio of patents, Chen remains a significant figure in the realm of inventors, continually pushing the boundaries of what is possible in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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