The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Jul. 29, 2010
Wai-kin LI, Hopewell Junction, NY (US);
Wu-song Huang, Hopewell Junction, NY (US);
Joy Cheng, San Jose, CA (US);
Kuang-jung Chen, Hopewell Junction, NY (US);
Wai-Kin Li, Hopewell Junction, NY (US);
Wu-Song Huang, Hopewell Junction, NY (US);
Joy Cheng, San Jose, CA (US);
Kuang-Jung Chen, Hopewell Junction, NY (US);
GlobalFoundries, Inc., Grand Cayman, KY;
Abstract
Embodiments of the present invention provide a method of forming a semiconductor structure. The method includes forming a set of shapes on top of a substrate; applying a layer of copolymer covering the substrate; causing the copolymer to form a plurality of cylindrical blocks both inside and outside the shapes; forming a pattern of contact holes from the plurality of cylindrical blocks; and transferring the pattern of contact holes to the substrate to form the semiconductor structure. In one embodiment, the shapes are rings and forming the set of shapes includes forming a set of rings that are equally and squarely spaced. In another embodiment, causing the copolymer to form the plurality of cylindrical blocks includes forming only one cylindrical block inside each of the rings and only one cylindrical block outside every four (4) squarely neighboring rings.