The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2014

Filed:

Nov. 06, 2009
Applicants:

Robert D. Allen, San Jose, CA (US);

Phillip J. Brock, San Jose, CA (US);

Kuang-jung Chen, Hopewell Junction, NY (US);

Alexander Friz, San Jose, CA (US);

Wu-song Huang, Hopewell Junction, NY (US);

Ratnam Sooriyakumaran, San Jose, CA (US);

Sally A. Swanson, San Jose, CA (US);

Hoa D. Truong, San Jose, CA (US);

Inventors:

Robert D. Allen, San Jose, CA (US);

Phillip J. Brock, San Jose, CA (US);

Kuang-Jung Chen, Hopewell Junction, NY (US);

Alexander Friz, San Jose, CA (US);

Wu-Song Huang, Hopewell Junction, NY (US);

Ratnam Sooriyakumaran, San Jose, CA (US);

Sally A. Swanson, San Jose, CA (US);

Hoa D. Truong, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

Coating compositions include a polymer including: wherein Ris a silicon containing moiety, Ris an acid stable lactone functionality, and Ris an acid labile lactone functionality; X, X, Xare independently H or CH; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.


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