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Location History:
- San Jose, CA (US) (2013 - 2015)
- Sunnyvale, CA (US) (1983 - 2017)
Company Filing History:
Years Active: 1983-2017
Title: Innovator Spotlight: Phillip Joe Brock
Introduction:
Phillip Joe Brock, a prolific inventor based in Sunnyvale, CA, has made significant contributions to the field of photoacid generating polymers and chemically amplified photoresist compositions. With an impressive 58 patents to his name, Brock is a trailblazer in the world of lithography and polymer chemistry.
Latest Patents:
Among his latest patents is "Photoacid generating polymers containing a urethane linkage for lithography." This innovative polymer consists of three key repeat units that work synergistically to facilitate lithographic processes effectively. Another notable patent is the "Chemically amplified photoresist composition and process for its use," which combines a phenolic polymer with a (meth)acrylate-based copolymer for enhanced photoresist performance.
Career Highlights:
Brock has honed his expertise while working at renowned companies such as IBM and Dynapol Corporation. His time at these prestigious organizations has allowed him to push the boundaries of polymer science and contribute groundbreaking inventions to the industry.
Collaborations:
Throughout his career, Brock has collaborated with esteemed colleagues such as Ratnam Sooriyakumaran and Robert David Allen. Together, they have contributed to the advancement of lithography technologies and the development of novel polymer compositions.
Conclusion:
In conclusion, Phillip Joe Brock stands out as a visionary inventor whose numerous patents underscore his dedication to innovation in the realms of lithography and polymer chemistry. His pioneering work continues to inspire future generations of inventors and researchers in the field.
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