The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8470516 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 25, 2013

Filed:

Aug. 18, 2009
Applicants:

Robert D. Allen, San Jose, CA (US);

Luisa Bozano, Los Gatos, CA (US);

Phillip Brock, Sunnyvale, CA (US);

Qinghuang Lin, Yorktown Heights, NY (US);

Alshakim Nelson, Fremont, CA (US);

Ratnam Sooriyakumaran, San Jose, CA (US);

Inventors:

Robert D. Allen, San Jose, CA (US);

Luisa Bozano, Los Gatos, CA (US);

Phillip Brock, Sunnyvale, CA (US);

Qinghuang Lin, Yorktown Heights, NY (US);

Alshakim Nelson, Fremont, CA (US);

Ratnam Sooriyakumaran, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): and


Find Patent Forward Citations

Allen, Robert. (2013). Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles (U.S. Patent No. 8470516). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8470516

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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