The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Aug. 18, 2009
Applicants:
Robert D. Allen, San Jose, CA (US);
Luisa Bozano, Los Gatos, CA (US);
Phillip Brock, Sunnyvale, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Alshakim Nelson, Fremont, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Inventors:
Robert D. Allen, San Jose, CA (US);
Luisa Bozano, Los Gatos, CA (US);
Phillip Brock, Sunnyvale, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Alshakim Nelson, Fremont, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): and