The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Jan. 31, 2008
Robert Allen, San Jose, CA (US);
Phillip Brock, Sunnyvale, CA (US);
Shiro Kusumoto, Yokkaichie, JP;
Yukio Nishimura, Yokkaichi, JP;
Daniel P. Sanders, San Jose, CA (US);
Mark Steven Slezak, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda K. Sundberg, Los Gatos, CA (US);
Hoa Trung, San Jose, CA (US);
Gregory M. Wallraff, San Jose, CA (US);
Robert Allen, San Jose, CA (US);
Phillip Brock, Sunnyvale, CA (US);
Shiro Kusumoto, Yokkaichie, JP;
Yukio Nishimura, Yokkaichi, JP;
Daniel P. Sanders, San Jose, CA (US);
Mark Steven Slezak, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda K. Sundberg, Los Gatos, CA (US);
Hoa Trung, San Jose, CA (US);
Gregory M. Wallraff, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
JSR Micro Inc., Sunnyvale, CA (US);
Abstract
Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.