Company Filing History:
1 out of 164,197 
1 out of 1 Years Active: 2011
Title: Shiro Kusumoto: Innovator in Photolithography
Introduction
Shiro Kusumoto is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of photolithography, particularly through his innovative patent related to photoresist technology. His work has implications for the semiconductor industry, where precision and efficiency are paramount.
Latest Patents
Kusumoto holds a patent for a self-topcoating photoresist for photolithography. This invention includes photoresist additive polymers and formulations that can be utilized in immersion lithography without requiring an additional topcoat. The resist compositions consist of a photoresist polymer, at least one photoacid generator, a solvent, and a photoresist additive polymer. Additionally, he has developed a method for forming using these photoresist formulations.
Career Highlights
Throughout his career, Shiro Kusumoto has worked with prominent companies in the technology sector. He has been associated with IBM and JSR Micro Inc., where he has applied his expertise in photolithography and contributed to advancements in semiconductor manufacturing.
Collaborations
Kusumoto has collaborated with notable professionals in his field, including Robert David Allen and Phillip Joe Brock. These collaborations have likely enriched his work and expanded the impact of his innovations.
Conclusion
Shiro Kusumoto's contributions to photolithography through his patented technologies demonstrate his role as a key innovator in the semiconductor industry. His work continues to influence advancements in this critical field.