The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2013

Filed:

Jan. 14, 2010
Applicants:

Robert D. Allen, San Jose, CA (US);

Phillip Brock, Sunnyvale, CA (US);

Daniel P. Sanders, San Jose, CA (US);

Linda K. Sundberg, Los Gatos, CA (US);

Inventors:

Robert D. Allen, San Jose, CA (US);

Phillip Brock, Sunnyvale, CA (US);

Daniel P. Sanders, San Jose, CA (US);

Linda K. Sundberg, Los Gatos, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 27/12 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.


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