The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Apr. 28, 2006
Robert David Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Carl E. Larson, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Hoa D Truong, San Jose, CA (US);
Robert David Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Carl E. Larson, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Hoa D Truong, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.