Hoa D Truong

This inventor holds 37 USPTO granted patents and 2 EPO patents, primarily in Photoresist Technology. Top assignees: International Business Machines Corporation, Central Glass Company, Limited, Jsr Corporation. Active years: 2001-2022.

USPTO Granted Patents = 37

% Patents Active = 37.8

EPO Patents = 2 (Patent Applications = 1)

Average Co-Inventor Count = 5.3

ph-index = 6

Forward Citations = 128(Granted Patents)

Location History:

Armonk, NY (US) (2015 - 2016)
San Jose, CA (US) (2001 - 2018)
Los Altos, CA (US) (2016 - 2021)
Santa Clara, CA (US) (2022)

Company Filing History:

37 out of 166,264

International Business Machines Corporation

patents

5 out of 1,010

Central Glass Company, Limited

Shin-Etsu Chemical Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2001-2022

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Areas of Expertise:

Photoresist

Lithography

Non-Ionic Generators

Directed Self-Assembly

Polymeric Compositions

Functionalized Polymers

Low Activation Energy

Chemical Amplification

Bilayer Systems

Silicon Coatings

Gap Fill Materials

Molecular Resists

37 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11226561 - Self-priming resist for generic inorganic hardmasks (2022-01-18),

2. 10915023 - Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers (2021-02-09),

3. 9983475 - Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators (2018-05-29),

4. 9951164 - Non-ionic aryl ketone based polymeric photo-acid generators (2018-04-24),

5. 9950999 - Non-ionic low diffusing photo-acid generators (2018-04-24),

6. 9879152 - Block copolymers for directed self-assembly applications (2018-01-30),

7. 9851639 - Photoacid generating polymers containing a urethane linkage for lithography (2017-12-26),

8. 9671694 - Wet strippable gap fill materials (2017-06-06),

9. 9389516 - Resist performance for the negative tone develop organic development process (2016-07-12),

10. 9244345 - Non-ionic photo-acid generating polymers for resist applications (2016-01-26),

11. 9057960 - Resist performance for the negative tone develop organic development process (2015-06-16),

12. 9057951 - Chemically amplified photoresist composition and process for its use (2015-06-16),

13. 8945808 - Self-topcoating resist for photolithography (2015-02-03),

14. 8900802 - Positive tone organic solvent developed chemically amplified resist (2014-12-02),

15. 8821978 - Methods of directed self-assembly and layered structures formed therefrom (2014-09-02),

Title: The Innovative Journey of Hoa D Truong

Introduction: Hoa D Truong is a pioneering inventor based in San Jose, CA, known for her groundbreaking contributions to various fields.

Latest Patents: Hoa D Truong holds several patents in the areas of technology and healthcare, showcasing her versatility and ingenuity.

Career Highlights: With a career spanning over two decades, Hoa D Truong has consistently pushed the boundaries of innovation, leading to significant advancements in her respective industries.

Collaborations: Throughout her career, Hoa D Truong has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and excellence.

Conclusion: Hoa D Truong's passion for innovation and her relentless drive to create a positive impact on society make her a true trailblazer in the world of inventions.