The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Aug. 12, 2016
International Business Machines Corporation, Armonk, NY (US);
Central Glass Co., Ltd., Yamaguchi, JP;
Takehisa Ishimaru, Tokyo, JP;
Satoru Narizuka, Kawagoe, JP;
Daniel P. Sanders, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
Rudy J. Wojtecki, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Central Glass Co., Ltd., Ube-shi, Yamaguchi, JP;
Abstract
Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.