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Satoru Narizuka

This inventor holds 49 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Fluorinated Polymers. Top assignees: Central Glass Company, Limited, International Business Machines Corporation, Jsr Corporation. Active years: 2001-2021.

USPTO Granted Patents = 49 (Patent Applications = 2)

% Patents Active = 46.9

EPO Patents = 2

Average Co-Inventor Count = 3.9

ph-index = 7

Forward Citations = 152(Granted Patents)

Location History:

Saitama, JP (2001 - 2015)
San Jose, CA (US) (2016)
Kawagoe, JP (2011 - 2018)
Tokyo, JP (2017 - 2021)

Company Filing History:

49 out of 1,010

Central Glass Company, Limited

patents

6 out of 166,264

International Business Machines Corporation

where one patent can have more than one assignee

Years Active: 2001-2021

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Areas of Expertise:

Lithium Oxygen Battery

Photo-Acid Generators

Fluorinated Polymers

Resist Composition

Electrolyte Composition

Sulfonic Acid Salts

Polymer Compounds

Fluorinated Dicarboxylic Acids

Pattern Formation

Fluorinated Sulfonate

Negative-Type Resist

Positive-Type Resist

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10957953 - Lithium oxygen battery and electrolyte composition (2021-03-23),

2. 9983475 - Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators (2018-05-29),

3. 9951164 - Non-ionic aryl ketone based polymeric photo-acid generators (2018-04-24),

4. 9950999 - Non-ionic low diffusing photo-acid generators (2018-04-24),

5. 9666918 - Lithium oxygen battery and electrolyte composition (2017-05-30),

6. 9488914 - Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same (2016-11-08),

7. 9244345 - Non-ionic photo-acid generating polymers for resist applications (2016-01-26),

8. 9221928 - Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method (2015-12-29),

9. 9182664 - Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same (2015-11-10),

10. 9152045 - Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method (2015-10-06),

11. 9024058 - Ammonium fluoroalkanesulfonates and a synthesis method therefor (2015-05-05),

12. 8993212 - Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same (2015-03-31),

13. 8889888 - Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt (2014-11-18),

14. 8877960 - Fluoroalkanesulfonic acid ammonium salts and method for producing same (2014-11-04),

15. 8846966 - Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt (2014-09-30),

Title: Satoru Narizuka - Innovative Inventor from Saitama, JP

Introduction: Satoru Narizuka is a renowned inventor hailing from Saitama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Satoru Narizuka's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge solutions for renewable energy storage systems.

Career Highlights: With over two decades of experience in research and development, Narizuka has led numerous projects that have resulted in patented technologies revolutionizing various industries.

Collaborations: Throughout his career, Satoru Narizuka has collaborated with leading research institutions, universities, and tech companies to bring his innovative ideas to life and make a lasting impact on the world.

Conclusion: Satoru Narizuka's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.

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