Satoru Narizuka

USPTO Granted Patents = 49 (Patent Applications = 2)

EPO Patents = 2

Average Co-Inventor Count = 3.9

ph-index = 7

Forward Citations = 152(Granted Patents)

Location History:

Saitama, JP (2001 - 2015)
San Jose, CA (US) (2016)
Kawagoe, JP (2011 - 2018)
Tokyo, JP (2017 - 2021)

Company Filing History:

49 out of 1,001

Central Glass Company, Limited

patents

6 out of 164,197

International Business Machines Corporation

where one patent can have more than one assignee

Years Active: 2001-2021

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Areas of Expertise:

Lithium Oxygen Battery

Photo-Acid Generators

Fluorinated Compounds

Resist Compositions

Polymeric Photo-Acid Generators

Fluorine-Containing Resins

Sulfonic Acid Salts

Pattern Formation Methods

Fluorinated Dicarboxylic Acids

Negative-Type Resist Composition

Positive-Type Resist Composition

Polymerizable Monomers

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10957953 - Lithium oxygen battery and electrolyte composition (2021-03-23),

2. 9983475 - Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators (2018-05-29),

3. 9951164 - Non-ionic aryl ketone based polymeric photo-acid generators (2018-04-24),

4. 9950999 - Non-ionic low diffusing photo-acid generators (2018-04-24),

5. 9666918 - Lithium oxygen battery and electrolyte composition (2017-05-30),

6. 9488914 - Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same (2016-11-08),

7. 9244345 - Non-ionic photo-acid generating polymers for resist applications (2016-01-26),

8. 9221928 - Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method (2015-12-29),

9. 9182664 - Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same (2015-11-10),

10. 9152045 - Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method (2015-10-06),

11. 9024058 - Ammonium fluoroalkanesulfonates and a synthesis method therefor (2015-05-05),

12. 8993212 - Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same (2015-03-31),

13. 8889888 - Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt (2014-11-18),

14. 8877960 - Fluoroalkanesulfonic acid ammonium salts and method for producing same (2014-11-04),

15. 8846966 - Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt (2014-09-30),

Title: Satoru Narizuka - Innovative Inventor from Saitama, JP

Introduction: Satoru Narizuka is a renowned inventor hailing from Saitama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Satoru Narizuka's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge solutions for renewable energy storage systems.

Career Highlights: With over two decades of experience in research and development, Narizuka has led numerous projects that have resulted in patented technologies revolutionizing various industries.

Collaborations: Throughout his career, Satoru Narizuka has collaborated with leading research institutions, universities, and tech companies to bring his innovative ideas to life and make a lasting impact on the world.

Conclusion: Satoru Narizuka's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

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2 patents pending:

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2 patents (EPO):

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