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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9152045 B1

PDFFull Text
Date of Patent:
Oct. 06, 2015

Filed:

Jun. 10, 2014

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

Applicant:

Central Glass Company, Limited, Ube-shi,Yamaguchi, JP;

Inventors:

Kazunori Mori, Saitama, JP;

Satoru Narizuka, Saitama, JP;

Fumihiro Amemiya, Fuchu, JP;

Masaki Fujiwara, Saitama, JP;

Assignee:

Central Glass Company, Limited, Ube-shi, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01); C08F 28/04 (2006.01); C08F 220/38 (2006.01); C08F 220/24 (2006.01); C08F 220/28 (2006.01); C07C 309/10 (2006.01); C08F 228/04 (2006.01); C08F 222/14 (2006.01); C08F 222/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/10 (2013.01); C08F 28/04 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); C08F 222/14 (2013.01); C08F 222/18 (2013.01); C08F 228/04 (2013.01); G03F 7/004 (2013.01); G03F 7/0041 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2039 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); C07C 2101/08 (2013.01); C07C 2101/14 (2013.01); C07C 2101/18 (2013.01); C07C 2103/74 (2013.01); C08F 2220/382 (2013.01);
Abstract

According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which 'a moiety capable of changing its developer solubility by the action of an acid' and 'a moiety having a photoacid generating function' are arranged with regularity.

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