Fumihiro Amemiya

Title: Fumihiro Amemiya: Innovator in Fluorine-Containing Resins

Introduction

Fumihiro Amemiya is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of materials science, particularly in the development of fluorine-containing resins. With a total of three patents to his name, Amemiya's work has advanced the capabilities of resist compositions used in pattern formation.

Latest Patents

Amemiya's latest patents include innovations such as a fluorine-containing sulfonic acid salt, a fluorine-containing sulfonic acid salt resin, and a resist composition along with a pattern forming method using the same. His fluorine-containing sulfonic acid salt resin features a repeating unit represented by a specific general formula. This resin is designed to enhance sensitivity, resolution, and reproducibility in mask pattern formation, while also achieving a low line edge roughness (LER). Additionally, his fluorine-containing sulfonate resin incorporates a photoacid generating function, which improves the resist resin's performance by allowing for changes in developer solubility when exposed to acid.

Career Highlights

Fumihiro Amemiya is currently employed at Central Glass Company, Limited, where he continues to innovate in the field of chemical engineering. His work has been instrumental in developing materials that meet the demands of modern technology.

Collaborations

Amemiya has collaborated with notable colleagues such as Kazunori Mori and Satoru Narizuka. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Fumihiro Amemiya's contributions to the field of fluorine-containing resins have positioned him as a key figure in materials science. His innovative patents reflect a commitment to enhancing the performance of resist compositions, which are crucial in various technological applications.