The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8791293 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 29, 2014

Filed:

Aug. 02, 2012
Applicants:

Kazunori Mori, Saitama, JP;

Satoru Narizuka, Saitama, JP;

Fumihiro Amemiya, Fuchu, JP;

Masaki Fujiwara, Saitama, JP;

Inventors:

Kazunori Mori, Saitama, JP;

Satoru Narizuka, Saitama, JP;

Fumihiro Amemiya, Fuchu, JP;

Masaki Fujiwara, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 309/10 (2006.01); C07C 309/06 (2006.01); C07C 303/22 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which 'a moiety capable of changing its developer solubility by the action of an acid' and 'a moiety having a photoacid generating function' are arranged with regularity.


Find Patent Forward Citations

Mori, Kazunori. (2014). Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method (U.S. Patent No. 8791293). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8791293

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