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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9488914 B1

PDFFull Text
Date of Patent:
Nov. 08, 2016

Filed:

Jan. 17, 2013

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Kazunori Mori, Kawagoe, JP;

Satoru Narizuka, Kawagoe, JP;

Yuji Hagiwara, Kawagoe, JP;

Fumihiro Amemiya, Kawagoe, JP;

Masaki Fujiwara, Kawagoe, JP;

Assignee:

Central Glass Company, Limited, Ube-shi, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08F 220/38 (2006.01); C07C 381/12 (2006.01); C07C 309/10 (2006.01); C07C 303/22 (2006.01); C07D 307/93 (2006.01); C07D 327/04 (2006.01); C07D 307/20 (2006.01); G03F 7/38 (2006.01); C08F 222/18 (2006.01); C08F 222/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 303/22 (2013.01); C07C 309/10 (2013.01); C07C 381/12 (2013.01); C07D 307/20 (2013.01); C07D 307/93 (2013.01); C07D 327/04 (2013.01); C08F 220/38 (2013.01); C08F 222/14 (2013.01); C08F 222/18 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01); C07C 2101/14 (2013.01); C07C 2102/42 (2013.01);
Abstract

Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, Rrepresents a hydrogen atom or a monovalent organic group, and Mrepresents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

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