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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9221928 B1

PDFFull Text
Date of Patent:
Dec. 29, 2015

Filed:

Jun. 15, 2012

Fluorine-containing sulfonate resin, fluorine-containing n-sulfonyloxyimide resin, resist composition and pattern formation method

Applicants:

Misugi Kato, Kawagoe, JP;

Yoshimi Isono, Kawagoe, JP;

Satoru Narizuka, Kawagoe, JP;

Ryozo Takihana, Kawagoe, JP;

Kazunori Mori, Kawagoe, JP;

Inventors:

Misugi Kato, Kawagoe, JP;

Yoshimi Isono, Kawagoe, JP;

Satoru Narizuka, Kawagoe, JP;

Ryozo Takihana, Kawagoe, JP;

Kazunori Mori, Kawagoe, JP;

Assignee:

Central Glass Company, Limited, Ube-shi, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Anna Malloy

Int. Cl.
CPC ...
C08F 20/38 (2006.01); C08F 22/24 (2006.01); C08F 28/02 (2006.01); C07C 309/12 (2006.01); G03F 7/028 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C07C 381/12 (2006.01); C07C 25/18 (2006.01); C07D 333/08 (2006.01); C07D 333/76 (2006.01); C07D 207/46 (2006.01); C07D 209/48 (2006.01);
U.S. Cl.
CPC ...
C08F 20/38 (2013.01); C07C 25/18 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 22/24 (2013.01); C08F 28/02 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); C07D 207/46 (2013.01); C07D 209/48 (2013.01); C07D 333/08 (2013.01); C07D 333/76 (2013.01); G03F 7/0046 (2013.01);
Abstract

A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

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