The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Nov. 06, 2014
International Business Machines Corporation, Armonk, NY (US);
Central Glass Co., Ltd., Ube-shi, Yamaguchi, JP;
Takehisa Ishimaru, San Jose, CA (US);
Satoru Narizuka, San Jose, CA (US);
Daniel P. Sanders, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Hoa D. Truong, Los Altos, CA (US);
Rudy J. Wojtecki, San Jose, CA (US);
Manabu Yasumoto, Kawagoe, JP;
International Business Machines Corporation, Armonk, NY (US);
Central Glass Co., LTD., Ube-Shi, Yamaguchi, JP;
Abstract
Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.