The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Oct. 21, 2015
International Business Machines Corporation, Armonk, NY (US);
Noel Arellano, Fremont, CA (US);
Joy Cheng, Taipei, TW;
Teddie P. Magbitang, San Jose, CA (US);
Jed W. Pitera, Portola Valley, CA (US);
Daniel P. Sanders, San Jose, CA (US);
Kristin Schmidt, Mountain View, CA (US);
Hoa D. Truong, San Jose, CA (US);
Ankit Vora, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Block copolymers (BCPs) for self-assembly applications comprise a linear fluorinated linking group L' joining a pair of adjacent blocks. A film layer comprising a BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented domain pattern when the underlayer is preferentially wetted by one domain of an otherwise identical self-assembled BCP in which all fluorines of L′ are replaced by hydrogen. The BCP can be a low-chi or high-chi BCP. In a preferred embodiment, the BCP comprises a styrene-based first block, and a second block comprises a carbonate and/or ester repeat unit formed by ring opening polymerization of a cyclic carbonate and/or cyclic ester monomer. The linking group L′ has a lower surface energy than each of the polymer blocks.