The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Apr. 28, 2006
Robert Allen David, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Carl E Larson, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Hoa D Truong, San Jose, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
Robert Allen David, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Carl E Larson, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Hoa D Truong, San Jose, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.