San Jose, CA, United States of America

Robert Allen David


Average Co-Inventor Count = 8.5

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2009-2015

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Innovations by Robert Allen David: A Visionary in Photolithography

Introduction

Robert Allen David, situated in San Jose, California, is a distinguished inventor known for his significant contributions to the field of photolithography. With a total of two patents to his name, his innovative ideas have paved the way for advancements in semiconductor manufacturing processes.

Latest Patents

David's most recent patents focus on enhancements in resist compositions for photolithography. The first patent, titled "Self-topcoating resist for photolithography," reveals resist compositions designed for immersion lithography, eliminating the necessity for an additional topcoat. This patent describes a formulation that combines a photoresist polymer, at least one photoacid generator, a solvent, and a self-topcoating resist additive. The outlined method provides an effective technique for creating patterned material layers on various substrates.

The second patent, "Topcoat material and use thereof in immersion lithography processes," describes a topcoat composition featuring a polymer with a dissolution rate of at least 1500 Å/second in an aqueous alkaline developer, accompanied by at least one solvent. This innovation enables the coating of photoresist layers on semiconductor chips, thus facilitating the formation of intricate patterns on the coated substrates.

Career Highlights

David is currently employed at International Business Machines Corporation (IBM), where he applies his expertise in the field of photolithography. His innovations play a crucial role in developing efficient processes for the production of semiconductor devices, which are integral to modern technology.

Collaborations

Throughout his career, Robert Allen David has collaborated with notable professionals, including Phillip Joe Brock and Ratnam Sooriyakumaran. These partnerships enhance the synergistic nature of innovation in research, driving forward advancements in photolithography.

Conclusion

Robert Allen David exemplifies the spirit of innovation in the technical realm of photolithography, with patents that contribute significantly to the semiconductor industry. His work at IBM, along with fruitful collaborations, underscores his commitment to advancing technology and fostering creativity in the field.

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