The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Apr. 28, 2006
Robert Allen David, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Sean David Burns, Hopewell Junction, NY (US);
Dario Leonardo Goldfarb, Mohegan Lake, NY (US);
David Medeiros, Dobbs Ferry, NY (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Matt Pinnow, Woodbury, MN (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Robert Allen David, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Sean David Burns, Hopewell Junction, NY (US);
Dario Leonardo Goldfarb, Mohegan Lake, NY (US);
David Medeiros, Dobbs Ferry, NY (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Matt Pinnow, Woodbury, MN (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 Å/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.