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Sean David Burns

This inventor holds 72 USPTO granted patents, primarily in Semiconductor Lithography (CPC class H01L). Top assignees: International Business Machines Corporation, Adeia Semiconductor Bonding Technologies Inc., Globalfoundries Inc.. Active years: 2008-2023.

USPTO Granted Patents = 72

% Patents Active = 52.8

Average Co-Inventor Count = 4.9

ph-index = 11

Forward Citations = 373(Granted Patents)

Forward Citations (Not Self Cited) = 339(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Yorktown Heights, NY (US) (2008 - 2014)
Armonk, NY (US) (2012 - 2015)
Hopewell Junction, NY (US) (2008 - 2023)

Company Filing History:

65 out of 166,264

International Business Machines Corporation

patents

6 out of 1,907

Adeia Semiconductor Bonding Technologies Inc.

Years Active: 2008-2023

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Areas of Expertise:

Self-Aligned Patterning

Semiconductor Device

Tight-Pitch Line Formation

Selective Gas Etching

Quadruple Patterning

Hardmask Techniques

Aerial Image Extraction

SRAM Cell Design

Multi-Angled Deposition

Conductive Lines

Overlay Relaxation

Image Transfer Process

72 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11670510 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2023-06-06),

2. 11646221 - Self-aligned pattern formation for a semiconductor device (2023-05-09),

3. 11610780 - Alternating hardmasks for tight-pitch line formation (2023-03-21),

4. 11302533 - Selective gas etching for self-aligned pattern transfer (2022-04-12),

5. 11301748 - Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography (2022-04-12),

6. 11227793 - Self-aligned pattern formation for a semiconductor device (2022-01-18),

7. 11031248 - Alternating hardmasks for tight-pitch line formation (2021-06-08),

8. 11018007 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2021-05-25),

9. 10957583 - Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs (2021-03-23),

10. 10930504 - Selective gas etching for self-aligned pattern transfer (2021-02-23),

11. 10614877 - 4T static random access memory bitcell retention (2020-04-07),

12. 10613438 - Self-aligned patterning methods which implement directed self-assembly (2020-04-07),

13. 10559467 - Selective gas etching for self-aligned pattern transfer (2020-02-11),

14. 10546774 - Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs (2020-01-28),

15. 10539881 - Generation of hotspot-containing physical design layout patterns (2020-01-21),

Title: The Innovative Journey of Sean David Burns

Introduction: Sean David Burns, a talented inventor hailing from Armonk, NY, has made significant contributions to the world of innovations with his creative mind and dedication to progress.

Latest Patents: Sean David Burns holds several patents in various fields, including technology, healthcare, and sustainability, showcasing his diverse range of expertise and interests.

Career Highlights: Throughout his career, Sean David Burns has been recognized for his groundbreaking inventions that have revolutionized industries and improved the lives of many. His commitment to pushing boundaries and thinking outside the box has led to numerous successful projects.

Collaborations: Sean David Burns has collaborated with leading experts in the field, including top researchers, engineers, and scientists, to bring his ideas to life. These collaborations have resulted in groundbreaking innovations that have set new standards in the industry.

Conclusion: Sean David Burns continues to inspire with his passion for innovation and his relentless drive to create a better future through his inventions. His work serves as a testament to the power of creativity and determination in shaping a brighter tomorrow.

Profile summary based on public USPTO records.

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