The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10539881 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 21, 2020

Filed:

Sep. 24, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jing Sha, White Plains, NY (US);

Dongbing Shao, Wappingers Falls, NY (US);

Martin Burkhardt, White Plains, NY (US);

Sean Burns, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70433 (2013.01); G06F 17/5081 (2013.01);
Abstract

A method for generating physical design layout patterns includes selecting as training data a set of physical design layout patterns of patterned structures. The method also includes training, utilizing physical design layout patterns containing hotspots, a first neural network model configured to generate synthetic physical design layout patterns, and training, utilizing physical design layout patterns that do and do not contain hotspots, a second neural network model configured to classify whether physical design layout patterns contain hotspots. The method further includes generating synthetic physical design layout patterns containing hotspots by utilizing the trained first neural network model to generate synthetic physical design layout patterns and utilizing the trained second neural network model to select the synthetic physical design layout patterns containing hotspots. The method further includes evaluating manufacturability of a given patterned structure comprising at least one of the synthetic physical design layout patterns containing at least one hotspot.


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