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Ossining, NY, United States of America

David Robert Medeiros

USPTO Granted Patents = 54 (Patent Applications = 3)

Average Co-Inventor Count = 5.1

ph-index = 11

Forward Citations = 1,099(Granted Patents)

Forward Citations (Not Self Cited) = 1,081(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Yorktown, NY (US) (2002 - 2004)
Dobbs Ferry, NY (US) (2004 - 2010)
Kitchawan, NY (US) (2004 - 2011)
Ossining, NY (US) (2002 - 2012)
West Stockbridge, MA (US) (2011 - 2012)
Hopewell Junction, NY (US) (2012)
Yorktown Heights, NY (US) (2002 - 2014)

Company Filing History:

53 out of 164,197

International Business Machines Corporation

Lnternational Business Machines Corporation

Years Active: 2002-2014

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Areas of Expertise:

Lithography

Photoresist Composition

Antireflective Hardmask

Organic-Inorganic Hybrid

Multilayer Resist Systems

High Performance CMOS Devices

Epitaxial Growth

Negative Resists

Ultralow Dielectric Constant Material

Chemically Amplified Resist

Polymers

Supercritical Fluid Silylation

54 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8652762 - Organic graded spin on BARC compositions for high NA lithography (2014-02-18),

2. 8574953 - Low temperature melt-processing of organic-inorganic hybrid (2013-11-05),

3. 8323871 - Antireflective hardmask composition and a method of preparing a patterned material using same (2012-12-04),

4. 8137874 - Organic graded spin on BARC compositions for high NA lithography (2012-03-20),

5. 8123997 - Low temperature melt-processing of organic-inorganic hybrid (2012-02-28),

6. 8084193 - Self-segregating multilayer imaging stack with built-in antireflective properties (2011-12-27),

7. 7960095 - Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates (2011-06-14),

8. 7875408 - Bleachable materials for lithography (2011-01-25),

9. 7847357 - High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same (2010-12-07),

10. 7816069 - Graded spin-on organic antireflective coating for photolithography (2010-10-19),

11. 7790593 - Method for tuning epitaxial growth by interfacial doping and structure including same (2010-09-07),

12. 7736833 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-06-15),

13. 7709177 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-05-04),

14. 7648820 - Antireflective hardmask and uses thereof (2010-01-19),

15. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),

Title: Unveiling the Inventive Mind of David Robert Medeiros

Introduction:

David Robert Medeiros, a prolific inventor based in Ossining, NY, has left an indelible mark in the realm of innovation. With a staggering 54 patents to his name, his unique blend of creativity and technical expertise has propelled him to the forefront of the industry.

Latest Patents:

1. "Organic graded spin on BARC compositions for high NA lithography": This patent showcases Medeiros' prowess in developing antireflective coatings, exemplifying his deep understanding of materials science and lithography.

2. "Low temperature melt-processing of organic-inorganic hybrid": This invention underscores his innovative approach to creating hybrid materials through novel melt-processing techniques, highlighting his commitment to pushing the boundaries of traditional manufacturing processes.

Career Highlights:

Having worked at renowned companies such as IBM, Medeiros has garnered invaluable experience and expertise in cutting-edge technologies. His contributions have not only enhanced the companies' intellectual property portfolios but have also paved the way for future advancements in the field.

Collaborations:

Throughout his career, Medeiros has collaborated with esteemed colleagues such as Wayne Martin Moreau and Wu-Song S Huang, fostering a culture of innovation and knowledge-sharing. These fruitful partnerships have led to the development of groundbreaking technologies and solutions that have shaped the industry landscape.

Conclusion:

In conclusion, David Robert Medeiros stands as a true visionary in the world of inventions, continuously pushing the boundaries of what is possible through his ingenuity and dedication to creating a better future for all. His extensive patent portfolio and impactful contributions underscore his commitment to innovation and excellence, solidifying his legacy as a trailblazer in the field of technology.

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