The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Feb. 24, 2010
Applicants:
Sean D. Burns, Yorktown Heights, NY (US);
David R. Medeiros, Hopewell Junction, NY (US);
Dirk Pfeiffer, Yorktown Heights, NY (US);
Inventors:
Sean D. Burns, Yorktown Heights, NY (US);
David R. Medeiros, Hopewell Junction, NY (US);
Dirk Pfeiffer, Yorktown Heights, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
An antireflective hardmask composition layer including a polymer having Si—O and non-silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.