The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Oct. 02, 2007
Marie Angelopoulos, Cortlandt Manor, NY (US);
Katherina E. Babich, Chappaqua, NY (US);
Douglas Charles Latulipe, Danbury, CT (US);
Qinghuang Lin, Mohegan Lake, NY (US);
David R. Medeiros, Dobbs Ferry, NY (US);
Wayne Martin Moreau, Wappingers Falls, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
John P. Simons, Wappingers Falls, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Katherina E. Babich, Chappaqua, NY (US);
Douglas Charles LaTulipe, Danbury, CT (US);
Qinghuang Lin, Mohegan Lake, NY (US);
David R. Medeiros, Dobbs Ferry, NY (US);
Wayne Martin Moreau, Wappingers Falls, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
John P. Simons, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.