The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Jan. 25, 2007
John A. Hoffnagle, San Jose, CA (US);
David R. Medeiros, Kitchawan, NY (US);
Robert D. Miller, San Jose, CA (US);
Libor Vycklicky, Yorktown Heights, NY (US);
Gregory M. Wallraff, Morgan Hill, CA (US);
John A. Hoffnagle, San Jose, CA (US);
David R. Medeiros, Kitchawan, NY (US);
Robert D. Miller, San Jose, CA (US);
Libor Vycklicky, Yorktown Heights, NY (US);
Gregory M. Wallraff, Morgan Hill, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organo-silicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals 'R' and 'Y' represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.