The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Aug. 12, 2004
Marie Angelopoulos, Cortlandt Manor, NY (US);
Gregory Breyta, San Jose, CA (US);
Wu-song Huang, Poughkeepsie, NY (US);
Robert Neal Lang, Pleasant Valley, NY (US);
Wenjie LI, Poughkeepsie, NY (US);
David R. Medeiros, Ossining, NY (US);
Wayne Martin Moreau, Wappingers Falls, NY (US);
Karen Elizabeth Petrillo, Voorheesville, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Gregory Breyta, San Jose, CA (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Robert Neal Lang, Pleasant Valley, NY (US);
Wenjie Li, Poughkeepsie, NY (US);
David R. Medeiros, Ossining, NY (US);
Wayne Martin Moreau, Wappingers Falls, NY (US);
Karen Elizabeth Petrillo, Voorheesville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.