IDiyas

For the Inventor, By the Inventor

Pleasant Valley, NY, United States of America

Robert Neal Lang

USPTO Granted Patents = 13

Average Co-Inventor Count = 7.3

ph-index = 6

Forward Citations = 149(Granted Patents)


Company Filing History:

goldMedal12 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 1992-2009

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):
1. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),
2. 7314700 - High sensitivity resist compositions for electron-based lithography (2008-01-01),
3. 6979518 - Attenuated embedded phase shift photomask blanks (2005-12-27),
4. 6821718 - Radiation sensitive silicon-containing negative resists and use thereof (2004-11-23),
5. 6730445 - Attenuated embedded phase shift photomask blanks (2004-05-04),
6. 6682860 - Attenuated embedded phase shift photomask blanks (2004-01-27),
7. 6653045 - Radiation sensitive silicon-containing negative resists and use thereof (2003-11-25),
8. 6586156 - Etch improved resist systems containing acrylate (or methacrylate) silane monomers (2003-07-01),
9. 6420084 - Mask-making using resist having SIO bond-containing polymer (2002-07-16),
10. 5976710 - Low TCE polyimides as improved insulator in multilayer interconnect (1999-11-02),
11. 5399462 - Method of forming sub-half micron patterns with optical lithography (1995-03-21),
12. 5240812 - Top coat for acid catalyzed resists (1993-08-31),
13. 5115090 - Viscosity stable, essentially gel-free polyamic acid compositions (1992-05-19),

Title: The Innovations of Robert Neal Lang

Introduction

Robert Neal Lang is a prominent inventor based in Pleasant Valley, NY (US). He holds a total of 13 patents, showcasing his significant contributions to the field of technology and materials science. His work primarily focuses on advancements in lithography and photoacid generator technologies.

Latest Patents

Among his latest patents is the "Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer." This invention involves a barrier layer that includes a polymeric photoacid generator formed between a substrate and a resist layer. This barrier layer is instrumental in forming a resist image and creating patterned material features on a substrate. Another notable patent is for "High sensitivity resist compositions for electron-based lithography." This patent describes resist compositions that incorporate an acid-sensitive imaging polymer and a radiation-sensitive acid generator component. These innovations enable the formation of high sensitivity resists suitable for various lithographic imaging applications, including EPL, EUV, and soft x-ray processes.

Career Highlights

Robert has had a distinguished career, including significant tenure at the International Business Machines Corporation (IBM). His work at IBM has allowed him to develop and refine technologies that have had a lasting impact on the industry.

Collaborations

Throughout his career, Robert has collaborated with notable professionals, including Marie Angelopoulos and Wayne Martin Moreau. These collaborations have contributed to the advancement of his innovative projects and patents.

Conclusion

Robert Neal Lang's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in lithography and materials science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…