The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Dec. 04, 2003
Marie Angelopoulos, Cortlandt Manor, NY (US);
Katherina Babich, Chappaqua, NY (US);
S. Jay Chey, Ossining, NY (US);
Michael Straight Hibbs, Westford, VT (US);
Robert N. Lang, Pleasant Valley, NY (US);
Arpan Pravin Mahorowala, Bronxville, NY (US);
Kenneth Christopher Racette, Fairfax, VT (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Katherina Babich, Chappaqua, NY (US);
S. Jay Chey, Ossining, NY (US);
Michael Straight Hibbs, Westford, VT (US);
Robert N. Lang, Pleasant Valley, NY (US);
Arpan Pravin Mahorowala, Bronxville, NY (US);
Kenneth Christopher Racette, Fairfax, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001% up to 15% at 157 nm) is obtained by this process.