Fairfax, VT, United States of America

Kenneth Christopher Racette


Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2003-2009

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: Kenneth Christopher Racette: Innovator in Photomask Technology

Introduction

Kenneth Christopher Racette is a notable inventor based in Fairfax, VT (US). He has made significant contributions to the field of photomask technology, holding a total of 9 patents. His work focuses on improving the quality and efficiency of optical masks used in electronic device production.

Latest Patents

One of Racette's latest patents is a "Method for reducing photo-mask distortion." This invention describes a structure and method aimed at reducing or eliminating the flatness distortion effects of a photomask assembly when a pellicle is mounted. The method involves a partial disconnection of the mounting area of the pellicle frame from the print area of the mask, utilizing a trench in the photomask as the means for this disconnection.

Another significant patent is the "Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices." This invention features a projection apparatus with an optical mask support stage that includes a pair of separated arms. Each arm is equipped with a mask chucking bar that supports the edges of a thin glass mask, applying a bending moment away from the center to reduce gravitational sag. This innovation enhances the quality of images projected by the apparatus.

Career Highlights

Kenneth Racette is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative solutions in photomask technology. His expertise and contributions have made a significant impact on the industry.

Collaborations

Racette has collaborated with notable coworkers, including Michael Straight Hibbs and Marie Angelopoulos. Their combined efforts have contributed to advancements in the field of photomask technology.

Conclusion

Kenneth Christopher Racette is a distinguished inventor whose work in photomask technology has led to several important patents. His innovations continue to influence the production of electronic devices, showcasing his commitment to advancing the field.

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