The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Mar. 30, 2008
Nancy Chenxin Zhou, Essex Junction, VT (US);
Kenneth C Racette, Fairfax, VT (US);
Robert James Nolan, Hinesburg, VT (US);
Nancy Chenxin Zhou, Essex Junction, VT (US);
Kenneth C Racette, Fairfax, VT (US);
Robert James Nolan, Hinesburg, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention describes a structure and method for reducing or eliminating the flatness distortion effects of a photomask assembly which occurs when a pellicle is mounted to the photomask. The invention is to perform a partial disconnection of the mounting area of the pellicle frame from the print area of the mask. An exemplary embodiment of the present invention achieves the distortion reduction or elimination using a trench in the photomask as the partial disconnection.