Company Filing History:
Years Active: 2009
Title: Innovations of Nancy Chenxin Zhou
Introduction
Nancy Chenxin Zhou is a notable inventor based in Essex Junction, VT (US). She has made significant contributions to the field of photomask technology, particularly in methods that enhance the quality and performance of photomasks used in semiconductor manufacturing.
Latest Patents
Nancy holds a patent for a "Method for reducing photo-mask distortion." This invention describes a structure and method aimed at reducing or eliminating the flatness distortion effects of a photomask assembly that occur when a pellicle is mounted to the photomask. The innovative approach involves performing a partial disconnection of the mounting area of the pellicle frame from the print area of the mask. An exemplary embodiment of this invention achieves distortion reduction or elimination by utilizing a trench in the photomask as the partial disconnection. She has 1 patent to her name.
Career Highlights
Nancy is currently employed at International Business Machines Corporation, commonly known as IBM. Her work at IBM has allowed her to engage in cutting-edge research and development in the field of semiconductor technology.
Collaborations
Throughout her career, Nancy has collaborated with esteemed colleagues, including Kenneth Christopher Racette and Robert James Nolan. These collaborations have contributed to her innovative work and advancements in photomask technology.
Conclusion
Nancy Chenxin Zhou is a pioneering inventor whose work in reducing photomask distortion has made a significant impact in the semiconductor industry. Her contributions continue to influence advancements in technology and innovation.