This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2009.
Company Filing History:
Years Active: 2009
Title: Innovations of Robert James Nolan
Introduction
Robert James Nolan is an accomplished inventor based in Hinesburg, Vermont. He has made significant contributions to the field of photomask technology, particularly in methods that enhance the quality and performance of photomasks used in semiconductor manufacturing.
Latest Patents
Nolan holds a patent for a "Method for reducing photo-mask distortion." This invention addresses the flatness distortion effects that occur when a pellicle is mounted to a photomask assembly. The method involves a partial disconnection of the mounting area of the pellicle frame from the print area of the mask. An exemplary embodiment of this invention utilizes a trench in the photomask to achieve distortion reduction or elimination. He has 1 patent to his name.
Career Highlights
Nolan is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to engage in cutting-edge research and development in the field of semiconductor technology.
Collaborations
Throughout his career, Nolan has collaborated with talented individuals such as Nancy Chenxin Zhou and Kenneth Christopher Racette. These collaborations have contributed to the advancement of innovative solutions in their respective fields.
Conclusion
Robert James Nolan's contributions to photomask technology exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in manufacturing processes and product quality.