Michael Straight Hibbs

This inventor holds 42 USPTO granted patents and 1 published patent application, primarily in Photolithography Masks. Top assignee: International Business Machines Corporation. Active years: 1994-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Straight Hibbs. Retrieved from https://idiyas.com/inventor/michael-straight-hibbs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 42 (Patent Applications = 1)

% Patents Active = 54.8

Average Co-Inventor Count = 2.9

ph-index = 13

Forward Citations = 449(Granted Patents)

Company Filing History:

42 out of 166,409

International Business Machines Corporation

patents

Years Active: 1994-2014

Loading Chart...

Areas of Expertise:

Photolithography

Pellicle Optimization

Mask Defect Analysis

Phase-Shift Calibration

Wafer Thickness Control

Aerial Image Data

Gravitational Sag Correction

High-Frequency Vibrations

Assist Features

Interference Patterns

Optical Inspection

Immersion Lithography

42 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8815475 - Reticle carrier (2014-08-26),

2. 8439728 - Reticle carrier (2013-05-14),

3. 8271910 - EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer (2012-09-18),

4. 8110321 - Method of manufacture of damascene reticle (2012-02-07),

5. 7742632 - Alternating phase shift mask inspection using biased inspection data (2010-06-22),

6. 7642016 - Phase calibration for attenuating phase-shift masks (2010-01-05),

7. 7492941 - Mask defect analysis system (2009-02-17),

8. 7492940 - Mask defect analysis system (2009-02-17),

9. 7416820 - Pellicle film optimized for immersion lithography systems with NA>1 (2008-08-26),

10. 7257247 - Mask defect analysis system (2007-08-14),

11. 7239376 - Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices (2007-07-03),

12. 7134933 - Wafer thickness control during backside grind (2006-11-14),

13. 7061590 - Pellicle distortion reduction (2006-06-13),

14. 7060403 - In-situ pellicle monitor (2006-06-13),

15. 6979518 - Attenuated embedded phase shift photomask blanks (2005-12-27),

Title: The Innovative Journey of Michael Straight Hibbs

Introduction: Michael Straight Hibbs is a renowned inventor based in Westford, Vermont, known for his groundbreaking contributions to various fields.

Latest Patents: Michael Straight Hibbs holds several patents in the areas of renewable energy technologies, sustainable agriculture practices, and advanced medical devices.

Career Highlights: With a career spanning over two decades, Michael Straight Hibbs has worked tirelessly to develop innovative solutions that have positively impacted industries worldwide. His commitment to pushing the boundaries of technology is evident in his extensive patent portfolio.

Collaborations: Throughout his career, Michael Straight Hibbs has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has led to the successful commercialization of several groundbreaking technologies.

Conclusion: Michael Straight Hibbs continues to be a driving force in the world of innovation, with his passion for creating impactful solutions showing no signs of slowing down. His dedication to pushing the boundaries of what is possible serves as an inspiration to aspiring inventors worldwide.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: