The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
May. 16, 2007
Kevin S. Petrarca, Newburgh, NY (US);
Donald F. Canaperi, Averill Park, NY (US);
Mahadevaiyer Krishnan, Hopewell Junction, NY (US);
Rebecca D. Mih, Los Gatos, CA (US);
Steven Steen, Peekskill, NY (US);
Henry Grabarz, Shelton, CT (US);
Michael S. Hibbs, Westford, VT (US);
Kevin S. Petrarca, Newburgh, NY (US);
Donald F. Canaperi, Averill Park, NY (US);
Mahadevaiyer Krishnan, Hopewell Junction, NY (US);
Rebecca D. Mih, Los Gatos, CA (US);
Steven Steen, Peekskill, NY (US);
Henry Grabarz, Shelton, CT (US);
Michael S. Hibbs, Westford, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps juxtaposed with the material filling the recess. Thereafter, the sacrificial materials are removed. Then the projection mask is planarized leaving feature recesses filled with transmissivity modifying material, and any gaps desired. The projection mask is planarized while retained in a fixture holding it in place during polishing with a polishing tool and a slurry.